Apple has not shipped an InFO-PoP with side-by-side integrated die yet. This is expected to be the first one, using RDLs for the die-to-die interconnect (so different than M-Ultra series that uses silicon bridges).
The terms to search for are fan-out wafer level packaging (FOWLP) and TSMC InFO. The chiplets come from different wafers and are reconstituted into a molded plastic wafer, allowing multiple die side-by-side. Then multiple layers of wires are built on top, terminating in a BGA.
Equipment for ion implantation already includes mini accelerators [1] [2]. The semiconductor equipment industry in general has many machines that feel like they came out of a physics lab into a semi fab. For example, plasma dry-etching or deep-reactive ion etching. EUV litho is just one of many very interesting problems--currently the bottleneck so it's talked about a lot.
You also need hundreds of other machines from Applied Materials, KLA Tencor, Lam Research, Tokyo Electron, etc. Then, years of process development R&D: what temperature do we bake this layer at, how long, what profile, what atmosphere in the tool… Every process step has a large parameter set to optimize. Creating a process is a painstaking many many variable optimization slog.
Just wanted to add that since I see people only mention ASML often here. They are very important, but there is so much more to TSMC’s success.